Kelin J. Kuhn
Intel Fellow, Technology and Manufacturing Group
Director, Advanced Device Technology
INTEL CORPORATION
Kelin J. Kuhn is an Intel Fellow, Technology and Manufacturing Group and director of Advanced Device Technology. Kuhn is responsible for device architecture path finding for Intel's advanced process technologies.
Kuhn joined Intel in 1997 working on Intel's 0.35 micron process technology. Since then, Kuhn has been involved in Intel's manufacturing process technology development for the 0.35 um, 130nm, 90nm, 45nm and 22nm technology nodes.
Previously, Kuhn was a tenured faculty member in the Department of Electrical and Computer Engineering at the University of Washington. Kuhn is the past recipient of a National Science Foundation Presidential Young Investigator Award for her work on strained layer III-V materials and an Intel IAA award for her work on Hi-K metal gate transistors. Kuhn has six patents with four others pending, is the author of more than 60 technical papers, and has authored a textbook on laser engineering.
Kuhn earned her bachelor's degree in electrical engineering from the University of Washington in 1980. Kuhn received her master's and doctoral degrees in electrical engineering from Stanford University in 1985.
|
